IIT Gandhinagar Project Associate-II Recruitment 2026 - Advt No. SPON/10455/Advt0290

Indian Institute of Technology (IIT) Gandhinagar, Research & Development Office invites online applications for a temporary position of Project Associate II under the project Silicon and Advanced Semiconductor Manufacturing Research and Training Hub (SAMARTH). Interested candidates who fulfil the required qualifications and experience may apply through the IIT Gandhinagar project staff recruitment portal by 30 August 2026.

Position Details

Application Link

Apply online at recruitment.iitgn.ac.in/projectstaff.

Required Qualification (as per Institute norms)

• M.Tech./M.S. or equivalent qualification in an appropriate discipline. OR
• B.Tech./B.E./M.Sc./M.C.A. or equivalent in an appropriate discipline with a minimum of 02 years of post-qualification experience.
• Minimum 60% or equivalent grade from Graduation onwards and 55% or equivalent grade in Class 10th and 12th.

Key Responsibilities

• Conduct research and development in computational lithography, including OPC, ILT, SMO, mask optimization and process window enhancement.
• Develop and implement GPU-accelerated algorithms for large-scale lithography simulations and optimization.
• Design and implement AI/ML and deep learning models for lithography optimization, hotspot detection, mask correction and pattern prediction.
• Develop simulation workflows for optical imaging, photoresist modeling and lithography process optimization.
• Build scalable software tools using modern programming frameworks for semiconductor manufacturing applications.
• Analyze simulation and experimental data and validate computational models.
• Collaborate with industry partners and academic researchers on sponsored R&D projects.
• Prepare technical reports, research publications, project documentation and presentations.
• Conduct workforce development programs in the computational lithography domain.

Essential Skills

• Strong programming skills in Python and C/C++.
• Experience with scientific computing and numerical algorithms.
• Good understanding of linear algebra, optimization techniques, and data structures.
• Excellent analytical, problem-solving, and communication skills.

Desirable Skills

• Prior experience in computational lithography, including Optical Proximity Correction (OPC), Inverse Lithography Technology (ILT), Source Mask Optimization (SMO), Resolution Enhancement Techniques (RET) or mask optimization.
• Experience with GPU programming using CUDA, OpenCL, or parallel computing frameworks.
• Knowledge of machine learning, deep learning, or scientific AI frameworks such as PyTorch or TensorFlow.
• Experience in high-performance computing (HPC), distributed computing, or multi-GPU programming.
• Familiarity with photolithography process, optical imaging or process simulation.
• Experience with numerical optimization, inverse problems, image processing, or computational electromagnetics.
• Proficiency with Linux environments, Git, and software development best practices.
• Prior research experience demonstrated through publications, conference presentations, open-source software contributions, or industrial projects.

Documents to Submit

Applicants must submit the following documents as part of their application:

1. Curriculum Vitae (CV) - covering educational qualifications, relevant projects, technical expertise and tool experience, professional experience, publications/patents, and awards/scholarships.
2. Statement of Purpose (SOP) (1-2 pages) - addressing motivation, prior experience, how technical skills align with the job description, and long-term career goals.

Contact

For query, please contact: Prof. Nihar Ranjan Mohapatra - Email: nihar@iitgn.ac.in

Merely meeting the minimum eligibility criteria will not guarantee the shortlisting and/or appointment. A higher cutoff level may be used. The Institute reserves all rights, not to call an applicant for a selection test or not to fill up a position without assigning any reason.

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